Highly reflective Mo/Be/Si multilayer mirrors with zero stress values for 13.5 nm wavelength

被引：0

作者：

Smertin, R. M. ^{[1
]}

Chkhalo, N. I. ^{[1
]}

Polkovnikov, V. N. ^{[1
]}

Salashchenko, N. N. ^{[1
]}

Shaposhnikov, R. A. ^{[1
]}

Zuev, S. Yu. ^{[1
]}

机构：

[1] RAS, Inst Phys Microstruct, Academicheskaya Str 7, Nizhnii Novgorod 607680, Russia

来源：

THIN SOLID FILMS | 2023年 / 782卷

基金：

俄罗斯科学基金会;

关键词：

Multilayer mirrors; X-rays; EUV lithography; Maskless X-ray lithography; Internal stresses; INTERNAL-STRESSES; FILMS; MO;

D O I：

10.1016/j.tsf.2023.140044

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This study investigates mechanical stresses in Mo/Be/Si multilayer mirrors. We determined layer thicknesses (for Si-1.0 nm, Mo-2.8 nm and Be-3.2 nm) in the period that simultaneously provided high reflection coefficients (R-66-67%) at a wavelength of 13.5 nm with zero internal stress values. At the wavelength of 13.5 nm, the reflection coefficient of a stressless Mo/Be/Si multilayer mirror deposited on a micro-electro-mechanical system of micromirrors had a value of about 23% with a reflection from the witness of 67%. An interferometric method for determining the stress values in films, which is able to provide a measurement accuracy at the level of Delta s +/- 0.24 MPa, is described in detail.

引用

页数：6

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