Physico-chemical properties of silicon-carbon films obtained by electrochemical deposition

被引：0

作者：

Bogush, I. Yu. ^{[1
]}

Plugotarenko, N. K. ^{[1
]}

Myasoedova, T. N. ^{[1
]}

Ptashnik, V. V. ^{[2
]}

机构：

[1] Southern Fed Univ, Inst Nanotechnol Microelect & Equipment Engn, Taganrog 347900, Russia

[2] Taganrog Sci Res Inst Commun, Joint Stock Co, Taganrog 347913, Russia

来源：

LETTERS ON MATERIALS | 2023年 / 13卷 / 01期

关键词：

silicon -carbon film; supercapacitor electrode material; mesoporous material;

D O I：

10.22226/2410-3535-2023-1-39-44

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Pure silicon-carbon films and the films doped with manganese or nickel were deposited on a copper foil by the electrochemical method from a methanol / hexamethyldisilazane solution. Scanning electron microscopy studies of silicon-carbon films showed a complex structure due to the presence of three-dimensional agglomerates and "leafy" structures. Raman spectroscopy showed that the silicon-carbon films were highly defective. The porosity study revealed that all samples mostly contained mesopores with sizes of 10 - 50 nm. The nickel-containing samples showed a more stable bimodal distribution of the mesopores. The highest specific surface area was observed for the manganese-containing silicon carbon films.

引用

页码：39 / 44

页数：6

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