Physico-chemical properties of silicon-carbon films obtained by electrochemical deposition

被引：0
|
作者：
Bogush, I. Yu. [1 ]
Plugotarenko, N. K. [1 ]
Myasoedova, T. N. [1 ]
Ptashnik, V. V. [2 ]
机构：
[1] Southern Fed Univ, Inst Nanotechnol Microelect & Equipment Engn, Taganrog 347900, Russia
[2] Taganrog Sci Res Inst Commun, Joint Stock Co, Taganrog 347913, Russia
来源：
LETTERS ON MATERIALS | 2023年 / 13卷 / 01期
关键词：
silicon -carbon film; supercapacitor electrode material; mesoporous material;
D O I：
10.22226/2410-3535-2023-1-39-44
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Pure silicon-carbon films and the films doped with manganese or nickel were deposited on a copper foil by the electrochemical method from a methanol / hexamethyldisilazane solution. Scanning electron microscopy studies of silicon-carbon films showed a complex structure due to the presence of three-dimensional agglomerates and "leafy" structures. Raman spectroscopy showed that the silicon-carbon films were highly defective. The porosity study revealed that all samples mostly contained mesopores with sizes of 10 - 50 nm. The nickel-containing samples showed a more stable bimodal distribution of the mesopores. The highest specific surface area was observed for the manganese-containing silicon carbon films.
引用
收藏
页码：39 / 44
页数：6
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