High Mobility IZTO Thin-Film Transistors Based on Spinel Phase Formation at Low Temperature through a Catalytic Chemical Reaction

In this paper, In0.22Zn delta Sn0.78-delta O1.89-delta (delta = 0.55) films with a single spinel phase are successfully grown at the low temperature of 300 degrees C through careful cation composition design and a catalytic chemical reaction. Thin-film transistors (TFTs) with amorphous In0.22Zn delta Sn0.78-delta O1.89-delta (delta = 0.55) channel layers have a reasonable mobility of 41.0 cm(2) V-1 s(-1) due to the synergic intercalation of In and Sn ions. In contrast, TFTs with polycrystalline spinel In0.22Zn delta Sn0.78-delta O1.89-delta (delta = 0.55) channel layers, achieved through a metal-induced crystallization at 300 degrees C, exhibit a remarkably high field-effect mobility of approximate to 83.2 cm(2) V-1 s(-1) and excellent stability against external gate bias stress, which is attributed to the uniform formation of the highly ordered spinel phase. The relationships between cation composition, microstructure, and performance for the In2O3-ZnO-SnO2 ternary component system are investigated rigorously to attain in-depth understanding of the roles of various crystalline phases, including spinel Zn2-ySn1-yIn2yO4 (y = 0.45), bixbyite In2-2xZnxInxO4 (x = 0.4), rutile SnO2, and a homologous compound of compound (ZnO)(k)(In2O3) (k = 5). This work concludes that the cubic spinel phase of Zn2-ySn1-yIn2yO4 (y = 0.45) film is a strong contender as a substitute for semiconducting polysilicon as a backplane channel ingredient for mobile active-matrix organic light-emitting diode displays.