Inhibited Degradation of Organic-Inorganic Perovskite-Based Quantum Dot Films via Rapid Annealing Temperatures

被引:0
|
作者
Huang, Pao-Hsun [1 ]
Lai, Pin-Jia [2 ]
Chen, Wen-Ray [3 ]
Liu, Chuan-Hsi [4 ]
Sze, Po-Wen [5 ]
Lien, Shui-Yang [6 ,7 ]
Huang, Chien-Jung [2 ]
机构
[1] Jimei Univ, Sch Ocean Informat Engn, Xiamen 361021, Peoples R China
[2] Natl Univ Kaohsiung, Dept Appl Phys, Kaohsiung Univ Rd, Kaohsiung 81148, Taiwan
[3] Natl Formosa Univ, Dept Elect Engn, Wenhua Rd, Huwei, Yunlin, Taiwan
[4] Natl Taiwan Normal Univ, Dept Mechatron Engn, Heping East Rd, Taipei 10610, Taiwan
[5] Kao Yuan Univ, Dept Elect Engn, Zhongshan Rd, Kaohsiung 82151, Taiwan
[6] Xiamen Univ Technol, Sch Optoelect & Commun Engn, Xiamen Key Lab Dev & Applicat Adv Semicond Coating, Xiamen 361024, Peoples R China
[7] Da Yeh Univ, Dept Mat Sci & Engn, Changhua 51591, Taiwan
关键词
perovskite; annealing; quantum dots; ligand-assisted reprecipitation; SOLAR-CELLS; ELECTRONIC-STRUCTURE; NANOCRYSTALS; STABILITY; CHEMISTRY; OXYGEN;
D O I
10.3390/cryst13030452
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
General hot-plate heating is used to form a crystal structure of films; however, how to achieve a homogeneous and regulated crystal formation will be a crucial challenge in the future. In this study, based on perovskite-series materials, organic methylamine lead trioxide (MAPbI(3)) films doped with inorganic lead iodide (CsPbI3) quantum dots (QDs) are treated using the rapid thermal annealing (RTA) process in argon gas to break the crystallization barrier. These RTA-treated perovskite quantum dot (PQD) films at various temperatures of 100-160 degrees C are detected using X-ray diffraction, X-ray spectroscopy, and absorbance measurements to investigate their structural and optical properties as well as their binding states. The experimental results demonstrate that the PQD film annealed at 120 degrees C has optimized characteristics, revealing better crystallinity and the lowest content of oxygen atoms (31.4%) and C-O-C bonding (20.1%). A too-high RTA temperature, more than 140 degrees C, causes severe degradation with the existence of PbI2. A proper RTA process, an alternative to normal heating and annealing, can effectively inhibit the occurrence of degradation and even usefully improve the performance of PQD films.
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页数:12
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