A novel capacitively coupled plasma driven by hollow cathode radio-frequency discharges

被引：0
|
作者：
Xiao, Xijian [1 ]
Wu, Jidun [1 ]
Cao, Qilu [1 ]
Huang, Xiaojiang [1 ,2 ,3 ]
机构：
[1] Donghua Univ, Coll Sci, Shanghai 201620, Peoples R China
[2] Minist Educ China, Magnet Confinement Fus Res Ctr, Shanghai 201620, Peoples R China
[3] Text Key Lab Adv Plasma Technol & Applicat, Shanghai 201620, Peoples R China
来源：
PHYSICA SCRIPTA | 2023年 / 98卷 / 03期
关键词：
Langmuir probe; electron temperature; electron density; hollow cathode capacitively coupled plasma; ENERGY;
D O I：
10.1088/1402-4896/acba58
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
New plasma sources with high density and low energy are required to process material surfaces in nanometers. In this study, an electrode integrated with a hollow cathode (HC) and capacitively coupled plasma (CCP) was developed. With the tool, a novel capacitively coupled plasma driven by the hollow cathode radio-frequency discharges (HC-CCP) was observed experimentally, and its properties in the center of the chamber were investigated by a Langmuir probe. The results demonstrated that the HC-CCP presents wide ranges of electron density (n ( e )), between 10(9) and 10(10) cm(-3), and electron energy (T ( e )), 3.5-6.7 eV. And their distributions can be controlled by the modulation of radio-frequency source power and frequency, work pressure, and bias voltage. Therefore, this plasma source can be applied to a new generation of material processing.
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页数：10
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