Current Prospects and Challenges in Negative-Capacitance Field-Effect Transistors

被引:5
|
作者
Islam, Md. Sherajul [1 ]
Mazumder, Abdullah Al Mamun [2 ]
Zhou, Changjian [3 ]
Stampfl, Catherine [4 ]
Park, Jeongwon [5 ,6 ]
Yang, Cary Y. Y. [7 ,8 ]
机构
[1] Khulna Univ Engn & Technol, Dept Elect & Elect Engn, Khulna 9203, Bangladesh
[2] Univ South Carolina, Elect Engn Dept, Columbia, SC 29208 USA
[3] South China Univ Technol, Sch Microelect, Guangzhou 510641, Peoples R China
[4] Univ Sydney, Sch Phys, Sydney, NSW 2006, Australia
[5] Univ Nevada, Dept Elect & Biomed Engn, Reno, NV 89557 USA
[6] Univ Ottawa, Sch Elect Engn & Comp Sci, Ottawa, ON K1N 6N5, Canada
[7] Santa Clara Univ, Elect & Comp Engn Dept, Santa Clara, CA 95053 USA
[8] Santa Clara Univ, TENT Lab, Santa Clara, CA 95053 USA
基金
美国国家科学基金会;
关键词
Iron; Electric fields; Capacitance; Permittivity; Capacitors; Hysteresis; Ferroelectric materials; Negative capacitance; QSNC model; INDEX TERMS; NCFET; VOLTAGE; MODEL; MV/DECADE; FINFETS; MFIS; FET;
D O I
10.1109/JEDS.2023.3267081
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
For decades, the fundamental driving force behind energy-efficient and cost-effective electronic components has been the downward scaling of electronic devices. However, due to approaching the fundamental limits of silicon-based complementary metal-oxide-semiconductor (CMOS) devices, various emerging materials and device structures are considered alternative aspirants, such as negative-capacitance field-effect transistors (NCFETs), for their promising advantages in terms of scaling, speed, and power consumption. In this article, we present a brief overview of the progress made on NCFETs, including theoretical and experimental approaches, a current understanding of NCFET device physics, possible physical mechanisms for NC, and future functionalization prospects. In addition, in the context of recent findings, critical technological difficulties that must be addressed in the NCFET development are also discussed.
引用
收藏
页码:235 / 247
页数:13
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