Advanced Plasma Science and its Applications for Nitrides and Nanomaterials

被引：0
|
作者：
Uchida, Giichiro [1 ]
Itoh, Takashi [2 ]
机构：
[1] Meijo Univ, Nagoya, Japan
[2] Gifu Univ, Gifu, Japan
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 2023年 / 62卷 / SN期
关键词：
D O I：
10.35848/1347-4065/acfc50
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页数：2
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