Multilevel resistive switching memory in lead-free double perovskite La2NiFeO6 films

被引:0
|
作者
Qin, Yongfu [1 ]
Gao, Yuan [1 ]
Lv, Fengzhen [1 ]
Huang, Fangfang [1 ]
Liu, Fuchi [1 ]
Zhong, Tingting [1 ]
Cui, Yuhang [1 ]
Tian, Xuedong [1 ]
机构
[1] Guangxi Normal Univ, Coll Phys Sci & Technol, Guangxi Key Lab Nucl Phys & Technol, Yucai Rd, Guilin 541000, Peoples R China
基金
美国国家科学基金会;
关键词
La2NiFeO6; Multilevel resistive switching; Oxygen vacancy; Space-charge-limited current; Schottky-like barrier; CHARGE-LIMITED CURRENTS; ELECTRICAL-CONDUCTION; OXIDE;
D O I
10.1186/s11671-023-03885-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Dense and flat La2NiFeO6 (LNFO) films were fabricated on the indium tin oxide-coated glass (ITO/glass) substrate by sol-gel method. The bipolar resistive switching behavior (BRS) could be maintained in 100 cycles and remained after 30 days, indicating that the LNFO-based RS device owned good memory stability. Surprisingly, the multilevel RS characteristics were firstly observed in the Au/LNFO/ITO/glass device. The high resistance states (HRSs) and low resistance state (LRS) with the maximum ratio of similar to 500 could be remained stably in 900 s and 130 cycles, demonstrating the fine retention and endurance ability of this LNFO-based RS device. The BRS behavior of Au/LNFO/ITO/glass devices primarily obeyed the SCLC mechanism controlled by oxygen vacancies (OVs) dispersed in the LNFO layer. Under the external electric field, injected electrons were captured or discharged by OVs during trapping or detrapping process in the LNFO layer. Thus, the resistive state switched between HRS and LRS reversibly. Moreover, the modulation of Schottky-like barrier formed at the Au/LNFO interface was contributed to the resistive states switchover. It was related to the change in OVs located at the dissipative region near the Au/LNFO interface. The multilevel RS ability of LNFO-based devices in this work provides an opportunity for researching deeply on the high density RS memory in lead-free double perovskite oxides-based devices.
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页数:10
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