Preparation of gradient refractive index films on glass surface and its anti-reflection properties

被引:8
|
作者
Zhang, Jiachang [1 ]
Yuan, Jian [1 ,2 ]
Tian, Peijing [1 ,2 ]
Mao, Jingyi [1 ]
Zhang, Qi [3 ,4 ]
机构
[1] Wuhan Univ Technol, State Key Lab Silicate Mat Architectures, 122 Luoshi Rd, Wuhan 430070, Hubei, Peoples R China
[2] Shahe Res Inst Glass Technol, Shahe 054100, Hebei, Peoples R China
[3] Univ Basque Country, Basque Ctr Mat Applicat & Nanostruct, BCMat, Sci Pk, Leioa 48940, Spain
[4] IKERBASQUE, Basque Fdn Sci, Plaza Euskadi, 5, Bilbao 48009, Spain
关键词
Anti-reflection coatings (ARCs); Acid etched; Hollow silicon oxide spheres; Sol-gel film; Gradient refractive index; SILICA SPHERES; COATINGS; BAND;
D O I
10.1016/j.jallcom.2023.172831
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This study presents the creation of a gradient refractive index film on the surface of aluminosilicate glass using a two-step process involving chemical etching and subsequent multilayer sol-gel coating with hollow silica nanospheres. The primary objective was to achieve effective anti-reflection properties. Various analytical techniques such as FESEM, TEM, UV-Vis-NIR spectrophotometry, ellipsometer, and FT-IR spectrometry were employed to investigate the impact of glass surface morphology and refractive index on optical characteristics. The results revealed the successful formation of a porous structure on the glass surface through chemical etching. Subsequently, this porous structure was uniformly filled and layered with hollow silica spheres of different sizes, resulting in a stepwise gradient refractive index coating. Notably, the pore size of the hollow spherical silica colloidal particles progressively increased from 0 nm to 23 nm, corresponding to distinct film thicknesses and refractive indices. This stepwise modulation contributed to the establishment of a gradient refractive index within the coating. By transitioning the refractive index of the film layer from that of glass to air, the film acted as a matching layer, thereby achieving broadband anti-reflection. The efficiency of this anti-reflection was demonstrated by an increase in transmittance from an initial value of 91.8-95.32% following the two-step etching process. With the subsequent SiO2 coating, the transmittance continued to improve, ultimately reaching a high value of 97.47%. This improvement in transmittance was attributed to the gradual enhancement of the film layer.
引用
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页数:8
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