Double Gaussian Distribution of Inhomogeneous Barrier Height in (Ni-Au)/Al0.25Ga0.75N/GaN

被引:1
|
作者
Saadaoui, Salah [1 ,2 ]
Fathallah, Olfa [2 ]
Maaref, Hassen [2 ]
机构
[1] King Khalid Univ, Fac Sci & Arts, Mohail Asir Campus Males, Abha, Saudi Arabia
[2] Univ Monastir, Fac Sci Monastir, Lab Microoptoelectron & Nanostruct, Ave Environm, Monastir 5000, Tunisia
关键词
AlGaN/GaN structure; Barrier inhomogeneity; Gaussian distribution; Deep traps; SCHOTTKY DIODES; TEMPERATURE-DEPENDENCE; INTERSECTING BEHAVIOR; ELECTRON-TRANSPORT; LEAKAGE CURRENT; PARAMETERS; MECHANISM; SILICON; STATES;
D O I
10.1007/s13538-022-01240-2
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The forward current-voltage (Ig-Vg) properties of the (Ni-Au)/Al0.25Ga0.75N/GaN/SiC structure were examined in the temperature range of 50-320K. Temperature has considerable influence on the zero-bias barrier height (phi(B0)), series resistance (Rs),and ideality factor (n).Furthermore, the standard Richardson plots of ln(I-0/T-2) vs. 10(3)/T for this sample revealed two linear zones (50-230 K and 230-320 K). For Al0.25Ga0.75N, the Richardson constant (A*) values in the linear zones were less than the predicted value (34.2 Acm(-2)K(-2)).This phenomenon is linked to the Schottky barrier inhomogeneities by adopting a double Gaussian distribution (GD) of the barrier heights (BHs) at the (Ni-Au)/Al0.25Ga0.75N interface. We attempted to establish an indication of the double GD of BHs for this sample by plotting phi(B0) vs. q/2kT. As a result, the Ig-Vg temperature dependency was satisfactorily described using the thermionic emission hypothesis with a double GD of the BHs at the (Ni-Au)/Al0.25Ga0.75N interface. These findings indicate that the inhomogeneous distribution of the surface and/or interface states is linked to the lateral inhomogeneity of the Schottky BH which is attributed to the defect existence confirming prior findings using the capacitance deep-level transient spectroscopy method.
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页数:11
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