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Effects of Electric Current on the Structural and Optical Properties of TiO2 Films
被引:0
|作者:
Santos, Edson Jose da Costa
[1
]
de Queiroz, Jose Cesar Augusto
[2
]
Liborio, Maxwell Santana
[3
,4
]
Sousa, Ivan Alves
[2
]
Nascimento, Igor Oliveira
[2
]
Feitor, Michelle Cequeira
[2
]
Costa, Thercio Henrique de Carvalho
[2
]
机构:
[1] Fed Inst Educ Sci & Technol Rio Grande Norte, Natal, RN, Brazil
[2] Univ Fed Rio Grande do Norte, Mech Engn Dept, Univ Campus, Natal, RN, Brazil
[3] Univ Campus, Sch Sci & Technol, Natal, RN, Brazil
[4] Univ Campus Lagoa Nova, Technol Ctr, BR-59072970 Natal, RN, Brazil
关键词:
TiO2 thin film;
Magnetron sputtering;
XRD;
Energy bandgap;
CHEMICAL-VAPOR-DEPOSITION;
RAY-DIFFRACTION METHODS;
PEROVSKITE THIN-FILMS;
PHOTOCATALYTIC ACTIVITY;
METROLOGICAL CHARACTERIZATION;
SURFACE-MORPHOLOGY;
CRYSTALLITE SIZE;
SCATTERING LAYER;
HYDROPHILICITY;
PERFORMANCE;
D O I:
10.1007/s13538-023-01352-3
中图分类号:
O4 [物理学];
学科分类号:
0702 ;
摘要:
TiO2 thin films were deposited on glass substrates through magnetron sputtering using a Ti target and an Ar-O-2 gas mixture, with different electrical currents ranging from 0.2 to 0.6 A. The impact of varying the current on the structure and properties of the TiO2 films was investigated in a systematic manner through techniques such as X-ray diffraction (XRD), scanning electron microscopy with field emission gun (SEM-FEG), Raman spectroscopy, and visible ultraviolet spectroscopy (UV/Vis). The XRD results indicated the presence of both anatase and rutile phases, with the intensities of these phases increasing as the electrical current increased. Furthermore, the crystallinity, particle size, transmittance, and interference fringes were observed to increase as the electrical current was raised.
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页数:9
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