MOCVD of WSe2 crystals on highly crystalline single- and multi-layer CVD graphene

被引:5
|
作者
Huet, Benjamin [1 ,2 ,3 ]
Bachu, Saiphaneendra [2 ]
Alem, Nasim [1 ,2 ]
Snyder, David W. [3 ]
Redwing, Joan M. [1 ,2 ]
机构
[1] Penn State Univ, Mat Res Inst, 2D Crystal Consortium Mat Innovat Platform, University Pk, PA 16802 USA
[2] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
[3] Penn State Univ, Appl Res Lab ARL, University Pk, PA 16802 USA
基金
美国国家科学基金会;
关键词
Graphene; Tungsten Diselenide; Heterostructure; Multilayer; Van der Waals; Epitaxy; CHEMICAL-VAPOR-DEPOSITION; ELECTRONIC-PROPERTIES; TUNGSTEN DISULFIDE; LAYER GRAPHENE; GROWTH; REACTIVITY; HETEROSTRUCTURES; MOS2; SIZE; DIFFUSION;
D O I
10.1016/j.carbon.2022.10.037
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The scalable synthesis of van der Waals vertical heterostructures (vdWHs) is viewed as an important milestone for the fabrication of novel 2D-based functional applications. Combining semi-metallic graphene with semiconducting transition metal dichalcogenides (TMDs) shows great potential to explore new device architectures with unique functionalities. In this work, we investigate the gas-source metal-organic chemical vapor deposition (MOCVD) of tungsten selenide (WSe2) on highly crystalline CVD graphene. Single-and multi -layer graphene constitute interesting testing grounds for investigating fundamental WSe2 growth mechanisms owing to its atomically smooth surface, absence of dangling bonds, chemical inertness, and hexagonal lattice symmetry. Our experimental results show how the graphene template properties influence the WSe2 nucleation site density, growth rate, in-plane orientation, and thickness. In particular, we found that WSe2 growth behavior strongly depends on the number of graphene layers, their stacking order/twisting angle, as well as on the nature of the substrate underneath.
引用
收藏
页码:150 / 160
页数:11
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