Epitaxial growth mechanism and ferroelectric property of c-oriented bismuth-layered CaBi2Nb2O9 film

被引:1
|
作者
Li, Yiguan [1 ,2 ]
Yu, Ziyi [3 ]
Fu, Zhengqian [3 ]
Liang, Ruihong [1 ]
Xu, FangFang [3 ]
Zhou, Zhiyong [1 ]
机构
[1] Chinese Acad Sci, Shanghai Inst Ceram, Key Lab Inorgan Funct Mat & Devices, 1295 Dingxi Rd, Shanghai 200050, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine M, Shanghai 200050, Peoples R China
关键词
THIN-FILMS; BOUNDARIES; SRBI2NB2O9; SRTIO3;
D O I
10.1063/5.0172005
中图分类号
O59 [应用物理学];
学科分类号
摘要
Exploring the epitaxial growth mechanism and ferroelectricity of CaBi2Nb2O9 (CBN) films is of great significance for its high-quality integration and application in ferroelectric memory. Herein, a high-quality (00l) CBN film was epitaxially grown on a NH4-HF solution etched SrTiO3 (STO) substrate by pulsed laser deposition. The epitaxial relationship of the CBN/STO heterostructure is (001)[100]CBN//(100)[110]STO, revealed by HRXRD and HRTEM. The single-layer Ca-O and double-layer Bi-O initial growth layers of CBN films were observed at the atomic scale and also discussed to clarify the factors affecting the growth modes. By comparing with the interface initial growth layer of BWO films, it is believed that the number of perovskite layers is an important factor affecting the quantity of the initial growth layers and growth mode in CBN films. In addition, the in-plane ferroelectricity of CBN thin films was demonstrated and the in-plane polarization switching was achieved by PFM measurement.
引用
收藏
页数:6
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