Relationship between low-frequency electromagnetic field and computer vision syndrome

- OBJECTIVE: This study aimed to determine the prevalence of computer vi-sion syndrome (CVS) among secretaries work-ing in different departments of a universi-ty hospital in Turkey and its relationship with low-frequency electromagnetic field (LF-EMF) exposure. SUBJECTS AND METHODS: This cross-sectional study included 143 secretaries work-ing in different departments of the hospital. Be-sides eye examinations, CVS Syndrome Ques-tionnaire (CVS-Q) Scale and Ocular Surface Disease Index Scale (OSDI) were applied to the participants. LF-EMF of the work environment were measured with a 6010 Gauss/Teslameter device and the light intensity with an LX-1102 Device. RESULTS: The mean age of participants was 39.6 years, with a male-to-female ratio of 25.2% to 74.8%. CVS-Q scale revealed 83.9% of com-puter vision syndrome among participants. A weak positive correlation was found between CVS-Q and LF-EMF, while a moderately strong, negative correlation was found between LF-EMF and Schirmer test of both eyes. The work environment LF-EMF values were significantly higher among the participants diagnosed with CVS (p<0.05). The risk of CVS was found to in-crease 3.27 times when the ambient LF-EMF was >1,725 mu T and an increase of 0.004 units in the CVS-Q score was calculated for each one -unit increase in the LF-EMF of the environment. CONCLUSIONS: A relationship between CVS, dry eye and EMF was observed among people exposed to LF-EMF. Regular measurement of EMF in work environments, and developing pro-tective behaviours (work-break intervals, 20-20-20 rule, etc.) can be recommended.