Optical Analysis of Far-Field Intensity on Organic Light-Emitting Diode to Reduce Surface Plasmon Losses

被引：0
|
作者：
Chaya, B. M. [1 ]
Guha, Koushik [2 ]
Venkatesha, M. [1 ]
Vaishnavi, A. [1 ]
Narayan, K. [1 ]
机构：
[1] Visvesvaraya Technol Univ, Sai Vidya Inst Technol, Bengaluru, Karnataka, India
[2] Natl Inst Technol, Dept ECE, Silchar, Assam, India
来源：
MICRO AND NANOELECTRONICS DEVICES, CIRCUITS AND SYSTEMS | 2023年 / 904卷
关键词：
Organic light-emitting diode; Far-field intensity; Light extraction efficiency; Finite difference time domain;
D O I：
10.1007/978-981-19-2308-1_7
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
In this article, we are explaining the electromagnetic models to simulate the effect of plasmon coupling at metal cathode and to analyze the OLED with nanograted cathode for reduction of surface plasmon loss. The modeling and analysis of the bottom-emitting organic light-emitting diode (OLED) using nano-grating metal cathode structures is presented. OLED is modeled and simulated by using finite difference time domain (FDTD) approach. The light extraction efficiency (LEE) has been improved by introducing nano-grating cathode structure that reduces surface plasmon (SP) losses. The proposed OLED without grated cathode and the device with nano-grated cathode comparison is shown. The intensity of far field is also studied for various cathode materials on an OLED device. It was found to be optimum for a wavelength of 540 nm for aluminum as a cathode material.
引用
收藏
页码：61 / 69
页数：9
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