Fundamentals of thin film depth profiling by glow discharge optical emission spectroscopy
被引:3
|
作者:
Vesel, Alenka
论文数: 0引用数: 0
h-index: 0
机构:
Jozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, SloveniaJozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, Slovenia
Vesel, Alenka
[1
]
论文数: 引用数:
h-index:
机构:
Zaplotnik, Rok
[1
]
Primc, Gregor
论文数: 0引用数: 0
h-index: 0
机构:
Jozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, SloveniaJozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, Slovenia
Primc, Gregor
[1
]
Mozetic, Miran
论文数: 0引用数: 0
h-index: 0
机构:
Jozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, SloveniaJozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, Slovenia
Mozetic, Miran
[1
]
机构:
[1] Jozef Stefan Inst, Dept Surface Engn, Jamova Cesta 39, Ljubljana 1000, Slovenia
Glow discharge optical emission spectroscopy (GDOES) is a useful technique for qualitative plasma characterization. It also enables depth profiling of solid materials upon exposure of samples to energetic positively charged ions from gaseous plasma, providing specifics of both surface- and gas-phase collision phenomena that are considered. The early stages of developing GDOES useful for the determination of surface composition and depth profiling of solid materials are reviewed and analyzed, stressing the contribution of early authors. The advantages as well as drawbacks of the GDOES technique are presented and discussed. The recent applications of this technique for depth profiling of various materials are presented, and the directions for constructing a laboratory-scale device are provided.