Optical properties of conductive and semi-insulating HVPE-GaN crystals

被引:1
|
作者
Cao, Wenhao [1 ]
Wang, Shouzhi [1 ,2 ]
Wang, Guodong [1 ,2 ]
Li, Lili [1 ]
Yu, Jiaoxian [3 ]
Liu, Lei [1 ,2 ]
Wang, Zhongxin [1 ]
Xu, Xiangang [1 ]
Hao, Han [1 ]
Zhang, Lei [1 ,2 ,4 ]
机构
[1] Shandong Univ, Inst Novel Semicond, State Key Lab Crystal Mat, Jinan 250100, Peoples R China
[2] Shandong Crystal GaN Semicond Co Ltd, Jinan 250100, Peoples R China
[3] Qilu Univ Technol, Shandong Acad Sci, Sch Mat Sci & Engn, Key Lab Proc & Testing Technol Glass & Funct Ceram, Jinan 250353, Peoples R China
[4] Shandong Res Inst Ind Technol, Jinan 250100, Shandong, Peoples R China
基金
中国国家自然科学基金;
关键词
RAMAN-SCATTERING; DOPED GAN; GROWTH; SI; PHASE; SAPPHIRE;
D O I
10.1039/d3ce01311a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Effective doping plays an important part in the marketization of gallium nitride (GaN) devices. Si and Fe are the most widely used doping elements when employing hydride vapor phase epitaxy, which change the electrical properties of GaN and form n-type and semi-insulating GaN after entering the GaN lattice, however, the light absorption caused by dopant atoms has a heavy impact on the performance of GaN optoelectronic devices, whereas the optical properties of Si- and Fe-doped GaN have been neglected. We investigated the macroscopic color differences of different doped elements to explore the reasons for changes in optical properties due to elemental doping. Si-doped GaN was more transparent because it did not produce additional absorption peaks in the visible range and the energy level density of the valence band increased. Fe-doped GaN appeared green because of Fe-3d at the bottom of the conduction band, which led to light absorption. Exciton recombination in the impurity energy levels led to the formation of intense green emission bands and absorption centers. Exploration of optical properties could provide a theoretical basis for the subsequent production of GaN optoelectronic devices. Effective doping plays an important part in the marketization of gallium nitride (GaN) devices.
引用
收藏
页码:1837 / 1842
页数:6
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