Analysis of a second peak of electron density observed in high-power impulse magnetron sputtering plasma using a Langmuir probe

被引：1

作者：

Chau, Kam-Hong ^{[1
,2
]}

Kawai, Yoshinobu ^{[3
,4
]}

Kan, Chi-Wai ^{[2
]}

Syu, Jia-Lin ^{[1
,3
]}

Liu, Yen-Chun ^{[1
,3
]}

Chen, Ying-Hung ^{[1
,3
]}

Liang, Chen-Jui ^{[3
,5
]}

He, Ju-Liang ^{[1
,3
]}

机构：

[1] Feng Chia Univ, Inst Plasma, 100 Wenhwa Rd, Taichung 40724, Taiwan

[2] Hong Kong Polytech Univ, Sch Fash & Text, Hung Hom, Kowloon, Hong Kong, Peoples R China

[3] Feng Chia Univ, Dept Mat Sci & Engn, 100 Wenhwa Rd, Taichung 40724, Taiwan

[4] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Kasugakoen 6-1, Kasuga, Fukuoka 8168580, Japan

[5] Feng Chia Univ, Int Sch Technol & Management, 100 Wenhwa Rd, Taichung 40724, Taiwan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2024年 / 63卷 / 01期

关键词：

Langmuir probe; hot electron; Penning ionization; ion density; electron density; plasma physics; PARAMETERS;

D O I：

10.35848/1347-4065/ad13a5

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma characteristics of a high-power impulse magnetron sputtering (HIPIMS) for copper deposition were investigated using a time-resolved Langmuir probe to explore HIPIMS discharge physics. Various discharge frequencies and pulse widths were employed while operating the HIPIMS in a constant current mode. Waveforms of the HIPIMS cathode current remained constant throughout the HIPIMS voltage pulse. It was found that electrons exhibited a bi-Maxwellian energy distribution both during and after the HIPIMS pulse. After the HIPIMS pulse, plasma density built up to a second peak while the bulk electron temperature quickly decreased. By examining the effect of pulse width and discharge frequency on the temperature of hot electrons through Langmuir I-V curves, it is suggested that the hot electron ionization contributed to the occurrence of the second peak.

引用

页数：6

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