Optimization and evaluation of a three-step pretreatment process for PCB microdrills

被引:4
|
作者
Zhang, Yuming [1 ,2 ]
Wang, Yiqian [2 ]
Su, Yifan [2 ]
Fan, Shuyu [2 ]
Dai, Mingjiang [2 ]
Lin, Songsheng [2 ]
TongchunKuang [1 ]
Shi, Qian [2 ]
机构
[1] South China Univ Technol, Sch Mat Sci & Engn, Guangzhou 510640, Peoples R China
[2] Guangdong Acad Sci, Inst New Mat, Natl Engn Lab Modern Mat Surface Engn Technol, Guangdong Prov Key Lab Modern Surface Engn Technol, Guangzhou 510651, Peoples R China
关键词
Microdrills; Diamond coatings; Pretreatment; Drilling tests; Fracture load; PRINTED-CIRCUIT BOARDS; WC-CO; DIAMOND COATINGS; SUBSTRATE PRETREATMENTS; CUTTING PERFORMANCE; DEPOSITION; MICRO; FILMS; INTERLAYERS; CARBIDES;
D O I
10.1016/j.ijrmhm.2023.106190
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The traditional Murakami two-step and three-step acid pretreatment processes were introduced to reduce the negative impact of Co on the cemented carbide tools during deposition of the diamond coatings. However, treatment methods requiring a longer etching time and a higher etching solution concentration lead to the formation of pores and cavities on the surface of the substrate, which would damage the substrate and thus significantly decrease the fracture load of the tools, especially microdrills with a small edge diameter. In this study, the pretreatment process of microdrills is optimized based on the traditional three-step process. The surface morphologies and Co content of the microdrills after pretreatment are investigated via scanning electron microscopy and energy-dispersive spectroscopy. The effect of the pretreatment on the fracture toughness of the microdrills and the adhesion of the diamond coatings is evaluated. The results show that the surface microstructure and fracture load of the microdrills are inevitably damaged during the acid and Murakami etching processes. Furthermore, the adhesion of the diamond coating depends on the final step of the acid etching process. The optimized three-step process consists of first etching with an acid solution for 10 s, then etching with a Murakami solution for 4 min, and finally etching with the acid solution for 30 s. This process improves the pretreatment efficiency and coating adhesion without significantly reducing the fracture load of the microdrills.
引用
收藏
页数:13
相关论文
共 50 条
  • [21] The 'Vienna Three-Step'
    Gutstein, D
    AMERICAN SCHOLAR, 2002, 71 (03): : 26 - 27
  • [22] Doing the three-step
    Rachel Smallridge
    Nature Reviews Molecular Cell Biology, 2003, 4 (5) : 343 - 343
  • [23] Quantum theory of high harmonic generation as a three-step process
    Kuchiev, MY
    Ostrovsky, VN
    PHYSICAL REVIEW A, 1999, 60 (04): : 3111 - 3124
  • [24] On a Three-Step Iteration Process for Suzuki Mappings with Qualitative Study
    Maniu, Georgeta
    NUMERICAL FUNCTIONAL ANALYSIS AND OPTIMIZATION, 2020, 41 (08) : 929 - 949
  • [25] Integrating ethics into the public administration curriculum: A three-step process
    Walton, JR
    Stearns, JM
    Crespy, CT
    JOURNAL OF POLICY ANALYSIS AND MANAGEMENT, 1997, 16 (03) : 470 - 483
  • [26] A Three-Step Process To Facilitate the Annulation of Polycyclic Aromatic Hydrocarbons
    Martin, Sara E.
    Streeter, Matthew D.
    Jones, Laurel L.
    Klepfer, Matthew S.
    Atmatzidis, Kyriakos
    Wille, Kristen D.
    Harrison, Sean A.
    Hoegg, Edward D.
    Sheridan, Heather M.
    Kramer, Stephanie
    Parrish, Damon A.
    Amick, Aaron W.
    JOURNAL OF ORGANIC CHEMISTRY, 2014, 79 (17): : 8324 - 8330
  • [27] LOW TEMPERATURE, THREE-STEP WATER SPLITTING PROCESS.
    Kittle, P.A.
    Mahoney, D.F.
    Schuler, J.E.
    1976, 1 Sess 5A : 3 - 6
  • [28] Three-step approach to designing a metal-forming process
    Gunasekera, Jay S.
    Ali, Amer F.
    JOM, 1995, 47 (06): : 22 - 25
  • [29] Time minimization for a three-step cyclic process of deposition and diffusion
    Arbuckle, J
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2004, 17 (01) : 22 - 24
  • [30] Boiler tube sealing is a two- or three-step process
    Yokell, S
    POWER, 1999, 143 (05) : 10 - 10