Epitaxial growth of bilayer MoS2/MoSe2 heterostructure with high-responsivity enhanced by photogating effect

被引:0
|
作者
Li, Fang [1 ]
An, Yani [1 ]
Yang, Tiefeng [2 ]
Yu, Changlin [1 ]
机构
[1] Guangdong Univ Petrochem Technol, Sch Chem Engn, Maoming 525000, Guangdong, Peoples R China
[2] Jinan Univ, Coll Sci & Engn, Guangzhou 510632, Guangdong, Peoples R China
基金
中国国家自然科学基金;
关键词
Semiconductors; Epitaxial growth; Electrical properties; DEVICES;
D O I
10.1016/j.matlet.2023.134954
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Van der Waals (vdW) semiconductors heterostructure based on transition metal dichalcogenides (TMDs) is a promising candidate for two-dimensional (2D) ultra-thin optoelectronic devices due to the strongly interlayer coupling and efficient carrier separation. However, the directly epitaxial growth of 2D TMDs vdW heterostructures with a clean interface and high photoresponsivity still remains a challenging. In this work, the epitaxial growth of bilayer MoS2/MoSe2 vdW heterostructure with atomic-layer clean interface is prepared via an iodine-assisted growth strategy. The electrical properties and optoelectronic characterization proves that the heterostructure device presents an enhanced photoresponsivity of 680 A/W, indicting the 21.25 times higher compared with pure MoS2, which benefited from the photogating effect formed by the localized electrons in this heterostructure. This study offers a well reference for the controlled growth of the TMDs vdW heterostructure, and the achieved heterostructure will prove promising applications in future integrated optoelectronic devices and systems.
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页数:4
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