Numerical analysis of the non-equilibrium plasma flow in the gaseous electronics conference reference reactor

被引:0
|
作者
杨弼杰 [1 ]
周宁 [2 ]
孙泉华 [1 ]
机构
[1] State Key Laboratory of High Temperature Gas Dynamics, Institute of Mechanics, Chinese Academy of Sciences
[2] Advanced Micro-Fabrication Equipment Inc
基金
中国国家自然科学基金;
关键词
capacitively coupled plasma; non-equilibrium flow; argon discharge;
D O I
暂无
中图分类号
O53 [等离子体物理学];
学科分类号
070204 ;
摘要
The capacitively coupled plasma in the gaseous electronics conference reference reactor is numerically investigated for argon flow using a non-equilibrium plasma fluid model. The finite rate chemistry is adopted for the chemical non-equilibrium among species including neutral metastable, whereas a two-temperature model is employed to resolve the thermal non-equilibrium between electrons and heavy species. The predicted plasma density agrees very well with experimental data for the validation case. A strong thermal non-equilibrium is observed between heavy particles and electrons due to its low collision frequency, where the heavy species remains near ambient temperature for low pressure and low voltage conditions(0.1 Torr, 100 V). The effects of the operating parameters on the ion flux are also investigated, including the electrode voltage, chamber pressure, and gas flow rate. It is found that the ion flux can be increased by either elevating the electrode voltage or lowering the gas pressure.
引用
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页码:135 / 140
页数:6
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