Measurement of charge transfer potential barrier in pinned photodiode CMOS image sensors

被引:0
|
作者
曹琛 [1 ]
张冰 [1 ]
王俊峰 [1 ]
吴龙胜 [2 ]
机构
[1] Xi'an Microelectronics Technology Institute
[2] Xi’anMicroelectronicsTechnologyInstitute
基金
国防预研究基金;
关键词
CMOS image sensors(CIS); pinned photodiode(PPD); charge transfer potential barrier(CTPB); photoresponse curve;
D O I
暂无
中图分类号
TP212 [发送器(变换器)、传感器];
学科分类号
080202 ;
摘要
The charge transfer potential barrier(CTPB) formed beneath the transfer gate causes a noticeable image lag issue in pinned photodiode(PPD) CMOS image sensors(CIS), and is difficult to measure straightforwardly since it is embedded inside the device. From an understanding of the CTPB formation mechanism, we report on an alternative method to feasibly measure the CTPB height by performing a linear extrapolation coupled with a horizontal left-shift on the sensor photoresponse curve under the steady-state illumination. The theoretical study was performed in detail on the principle of the proposed method. Application of the measurements on a prototype PPD-CIS chip with an array of 160×160 pixels is demonstrated. Such a method intends to shine new light on the guidance for the lag-free and high-speed sensors optimization based on PPD devices.
引用
收藏
页码:60 / 64
页数:5
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