Localization correction to the anomalous Hall effect in amorphous CoFeB thin films
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作者:
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丁进军
[1
,2
]
吴少兵
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机构:
School of Optical and Electronic Information,Huazhong University of Science and TechnologySchool of Optical and Electronic Information,Huazhong University of Science and Technology
吴少兵
[1
]
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杨晓非
[1
]
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机构:
朱涛
[2
]
机构:
[1] School of Optical and Electronic Information,Huazhong University of Science and Technology
[2] Institute of Physics and Beijing National Laboratory for Condensed Matter Physics,Chinese Academy of Sciences
anomalous Hall effect;
weak localization;
CoFeB thin films;
D O I:
暂无
中图分类号:
O484.4 [薄膜的性质];
学科分类号:
080501 ;
1406 ;
摘要:
An obvious weak localization correction to anomalous Hall conductance(AHC) in very thin CoFeB film is reported.We find that both the weak localization to AHC and the mechanism of the anomalous Hall effect are related to the CoFeB thickness.When the film is thicker than 3 nm,the side jump mechanism dominates and the weak locaUzation to AHC vanishes.For very thin CoFeB films,both the side jump and skew scattering mechanisms contribute to the anomalous Hall effect,and the weak localization correction to AHC is observed.
机构:
Capital Normal Univ, Dept Phys, Beijing 100048, Peoples R China
Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, Beijing 100190, Peoples R ChinaCapital Normal Univ, Dept Phys, Beijing 100048, Peoples R China
Na, Liu
Hai, Wang
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Capital Normal Univ, Dept Phys, Beijing 100048, Peoples R ChinaCapital Normal Univ, Dept Phys, Beijing 100048, Peoples R China
Hai, Wang
Tao, Zhu
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Chinese Acad Sci, Inst Phys, State Key Lab Magnetism, Beijing 100190, Peoples R ChinaCapital Normal Univ, Dept Phys, Beijing 100048, Peoples R China