Design and implementation of 83-nm low noise InP-based InAlAs/InGaAs PHEMTs

被引:0
|
作者
王志明 [1 ]
赵卓彬 [1 ]
胡志富 [2 ]
黄辉 [3 ]
崔玉兴 [2 ]
孙希国 [2 ]
默江辉 [2 ]
李亮 [2 ]
付兴昌 [2 ]
吕昕 [1 ]
机构
[1] Beijing Key Laboratory of Millimeter Wave and Terahertz Technology, Beijing Institute of Technology
[2] Hebei Semiconductor Research Institute
[3] National Institute of Metrology
基金
中国国家自然科学基金;
关键词
InP; PHEMT; millimeter wave; low noise; on-wafer measurement;
D O I
暂无
中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
83-nm T-shaped gate InP-based In;Al;As/In;Ga;As pseudomorphic high electron mobility transistors(PHEMTs) with excellent DC and RF performance as well as low noise characteristics are reported,including a maximum saturation current density I;of 894 mA/mm,a maximum extrinsic transconductance g;of 1640 mS/mm,an extrapolated cutoff frequency f;of 247 GHz and a maximum oscillation frequency f;of392 GHz which were based on the measured S-parameters from 1 to 110 GHz.The minimum noise figure(NF;)measured by the cold-source method is 1 dB at 30 GHz associated with a gain of 14.5 dB at V;of 0.8 V and I;of17 mA.These results were obtained by the combination of increased InAs mole fraction in the channel,gate size scaling,parasitic reduction and the quantization channel.These excellent results make it one of the most suitable devices for millimeter wave(MMW) low noise applications.
引用
收藏
页码:87 / 91
页数:5
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