Correlations between the Optical Properties and the Microstructure of TiO2 Thin Films Prepared by Reactive Electron-beam Evaporation

被引:0
|
作者
王学华 [1 ]
机构
[1] Wuhan University of Technology
关键词
thin film; titania; XRD; SEM; reactive evaporation;
D O I
暂无
中图分类号
TB43 [薄膜技术];
学科分类号
0805 ;
摘要
High refractive index TiO 2 thin films were deposited on BK7 glass by reactive electron-beam (REB) evaporation at pressure of 2×10 -2Pa,deposition rate of 0.2nm/s and at various substrate temperatures from 120℃ to 300℃.The refractive index and the thickness of the films were measured by visible spectroscopic ellipsometry (SE) and determined from transmission spectra.Optical properties and structure features were characterized by UV-VIS,SEM and XRD,respectively.The measurement and analysis on transmission spectra of all samples show that with the substrate temperature increasing from 120℃ to 300℃,the refractive indices of thin films increase from 1.7 to 2.1 and the films after heat treatment have higher refractive indices due to its crystallizing.The XRD analysis results indicate that the structure of TiO 2 thin films deposited on BK7 glass at substrate temperatures of 120℃,200℃ and 300℃ is amorphous,after post-annealing under air condition at 400℃ for 1 hour,the amorphous structure is crystallized,the crystal phase is of 100% anatase with strong preferred orientation (004) and the grain size of crystalline is within 3.6-8.1nm,which is consistent with results from SEM observation.
引用
收藏
页码:73 / 76
页数:4
相关论文
共 50 条
  • [11] Structure and properties of anatase TiO2 thin films made by reactive electron beam evaporation
    van de Krol, R
    Goossens, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2003, 21 (01): : 76 - 83
  • [12] A spectroscopic ellipsometry study of TiO2 thin films prepared by ion-assisted electron-beam evaporation
    Eiamchai, Pitak
    Chindaudom, Pongpan
    Pokaipisit, Artorn
    Limsuwan, Pichet
    CURRENT APPLIED PHYSICS, 2009, 9 (03) : 707 - 712
  • [13] Nanocrystalline TiO2 Thin Films Prepared by Electron Beam Evaporation for Photodetector Applications
    Huang, Huolin
    Xie, Yannan
    Wu, Zhengyun
    INEC: 2010 3RD INTERNATIONAL NANOELECTRONICS CONFERENCE, VOLS 1 AND 2, 2010, : 1222 - 1223
  • [14] PROPERTIES OF TIN OXIDE-FILMS PREPARED BY REACTIVE ELECTRON-BEAM EVAPORATION
    BANERJEE, R
    DAS, D
    THIN SOLID FILMS, 1987, 149 (03) : 291 - 301
  • [15] Correlation between microstructure and the optical properties of TiO2 thin films prepared on different substrates
    Leprince-Wang, Y
    Yu-Zhang, K
    Van, VN
    Souche, D
    Rivory, J
    THIN SOLID FILMS, 1997, 307 (1-2) : 38 - 42
  • [16] Study of Stress in TiO2 Films Grown by Electron-Beam Evaporation
    Chen, Tao
    Wang, Duoshu
    Xiong, YuQing
    MANUFACTURING PROCESS TECHNOLOGY, PTS 1-5, 2011, 189-193 : 1233 - 1237
  • [17] Study Of Stress in TiO2 films grown by electron-beam evaporation
    Chen Tao
    Luo Chong-tai
    Wang Duo-shu
    Xiong Yu-qing
    VACUUM TECHNOLOGY AND SURFACE ENGINEERING - PROCEEDINGS OF THE 9TH VACUUM METALLURGY AND SURFACE ENGINEERING CONFERENCE, 2009, : 195 - 200
  • [18] Stress properties of oxide thin films prepared by reactive electron beam evaporation
    Xiong, S.M.
    Zhang, Y.D.
    Tang, J.F.
    Guangdian Gongcheng/Opto-Electronic Engineering, 2001, 28 (01): : 13 - 15
  • [19] Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering
    Kruchinin, V. N.
    Perevalov, T. V.
    Atuchin, V. V.
    Gritsenko, V. A.
    Komonov, A. I.
    Korolkov, I. V.
    Pokrovsky, L. D.
    Shih, Cheng Wei
    Chin, Albert
    JOURNAL OF ELECTRONIC MATERIALS, 2017, 46 (10) : 6089 - 6095
  • [20] Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering
    V. N. Kruchinin
    T. V. Perevalov
    V. V. Atuchin
    V. A. Gritsenko
    A. I. Komonov
    I. V. Korolkov
    L. D. Pokrovsky
    Cheng Wei Shih
    Albert Chin
    Journal of Electronic Materials, 2017, 46 : 6089 - 6095