Double-gate tunnel field-effect transistor:Gate threshold voltage modeling and extraction

被引:0
|
作者
李妤晨 [1 ]
张鹤鸣 [1 ]
胡辉勇 [1 ]
张玉明 [1 ]
王斌 [1 ]
周春宇 [1 ]
机构
[1] Key Laboratory for Wide Band-Gap Semiconductor Materials and Devices,School of Microelectronics,Xidian University
基金
高等学校博士学科点专项科研基金; 中央高校基本科研业务费专项资金资助;
关键词
tunnel field-effect transistor; gated P-I-N diode; threshold voltage; modeling; extraction;
D O I
暂无
中图分类号
TN386 [场效应器件];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
The tunnel field-effect transistor(TFET) is a potential candidate for the post-CMOS era.As one of the most important electrical parameters of a device,double gate TFET(DG-TFET) gate threshold voltage was studied.First,a numerical simulation study of transfer characteristic and gate threshold voltage in DG-TFET was reported.Then,a simple analytical model for DG-TFET gate threshold voltage VTG was built by solving quasi-two-dimensional Poisson equation in Si film.The model as a function of the drain voltage,the Si layer thickness,the gate length and the gate dielectric was discussed.It is shown that the proposed model is consistent with the simulation results.This model should be useful for further investigation of performance of circuits containing TFETs.
引用
收藏
页码:587 / 592
页数:6
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