Study on the Effect of Base Pressure on Magnetron Sputtering Discharge Plasma by Optical Emission Spectroscopy

被引:0
|
作者
S.YUGESWARAN [1 ]
K.SURESH [1 ]
V.SELVARAJAN [1 ]
机构
[1] Plasma Physics Laboratory, Department of Physics, Bharathiar University
关键词
argon plasma; magnetron sputtering; emission spectroscopy; Boltzmann temperature;
D O I
暂无
中图分类号
O536 [辐射与测量];
学科分类号
摘要
Argon plasma was generated by DC magnetron sputtering discharge at a constantinput power and sputtering pressure. The emission spectra of the argon plasma, in a region of300 nm to 800 nm, were recorded with three different base pressures (4×10;Pa, 13×10;Pa and26×10;Pa). From the spectra, the Boltzmann temperature (T;) was calculated by using theatomic Boltzmann plot method. The intensity ratio of N and N;lines provided the information onthe changes in the degree of dissociation of nitrogen molecules. The obtained results showed thatwith the increase in base pressure the dissociation of N2 increased and the Boltzmann temperature(T;) decreased.
引用
收藏
页码:35 / 40
页数:6
相关论文
共 50 条
  • [41] Titanium density analysed by optical absorption and emission spectroscopy in a dc magnetron discharge
    Gaillard, M.
    Britun, N.
    Kim, Yong M.
    Han, Jeon G.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2007, 40 (03) : 809 - 817
  • [42] DIAGNOSTICS BY OPTICAL-EMISSION SPECTROSCOPY IN THE VICINITY OF THE SUBSTRATE DURING MAGNETRON SPUTTERING OF TI
    PECH, T
    CHABRERIE, JP
    RICARD, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (05): : 2987 - 2991
  • [43] Deposition of alumina films by inverted cylindrical magnetron sputtering assisted by optical emission spectroscopy
    Khanna, Atul
    Bhat, Deepak G.
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2017, 55 (01) : 19 - 24
  • [44] Plasma Emission Spectroscopy to Study the Resputtering Produced by Pulsed Laser Deposition of Au and in Combination With Magnetron Sputtering of ZnO
    Depablos-Rivera, Osmary
    Alvarez-Mendoza, Raul
    Martinez-Fuentes, Marco
    Sanchez-Ake, Citlali
    Villagran-Muniz, Mayo
    Garcia-Fernandez, Tupak
    Muhl, Stephen
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2021, 49 (07) : 2125 - 2132
  • [45] Magnetron discharge sputtering for fabrication of nanogradient optical coatings
    Volpian, O. D.
    Kuzmichev, A. I.
    Ermakov, G. F.
    Krikunov, A. I.
    Obod, Yu A.
    Silin, N. V.
    Shkatula, S. V.
    12TH INTERNATIONAL CONFERENCE ON GAS DISCHARGE PLASMAS AND THEIR APPLICATIONS, 2015, 652
  • [46] Effect of E x B electron drift and plasma discharge in dc magnetron sputtering plasma
    Borah, Sankar Moni
    Pal, Arup Ratan
    Bailung, Heremba
    Chutia, Joyanti
    CHINESE PHYSICS B, 2011, 20 (01)
  • [47] Investigations on plasma parameters of diaphragm discharge plasma based on optical emission spectroscopy
    Watanabe, Taichi
    Zen, Shungo
    Takeuchi, Nozomi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SL)
  • [48] CHARACTERISTICS OF TiNi THIN FILMS DEPOSITED BY MAGNETRON SPUTTERING SYSTEM WITH OPTICAL EMISSION SPECTROSCOPY MONITOR
    Liu, Erqiang
    Bao, Mingdong
    Yuan, Guozheng
    Xiao, Gesheng
    Jin, Tao
    Li, Zhigang
    Shu, Xuefeng
    SURFACE REVIEW AND LETTERS, 2015, 22 (05)
  • [49] Time-resolved optical emission spectroscopy of pulsed RF plasmas with copper magnetron sputtering
    Kang, Namjun
    Park, Junghoon
    Oh, Soo-ghee
    Kim, Yongmo
    Han, Jeon-geon
    THIN SOLID FILMS, 2008, 516 (11) : 3460 - 3463
  • [50] Optical Emission Spectroscopy of High Power Impulse Magnetron Sputtering (HiPIMS) of CIGS Thin Films
    Olejnicek, Jiri
    Hubicka, Zdenek
    Kohout, Michal
    Ksirova, Petra
    Brunclikova, Michaela
    Kment, Stepan
    Cada, Martin
    Darveau, Scott A.
    Exstrom, Christopher L.
    2014 IEEE 40TH PHOTOVOLTAIC SPECIALIST CONFERENCE (PVSC), 2014, : 1666 - 1669