Zinc tin oxide thin films prepared by MOCVD with different Sn/Zn ratios

被引:0
|
作者
Ying Xu [1 ]
Lin-Yan Hou [1 ]
Xiao-Meng Zhang [1 ]
机构
[1] Hebei Province Key Laboratory of Inorganic Nonmetallic Materials, Materials Science and Engineering College, North China University of Science and Technology
基金
中国国家自然科学基金;
关键词
Sn/Zn ratio; MOCVD; ZTO thin films; Envelope method; Optical properties;
D O I
暂无
中图分类号
TN304.055 [];
学科分类号
0805 ; 080501 ; 080502 ; 080903 ;
摘要
Zinc tin oxide(ZTO) thin films, with zinc acetate and tributyltin chloride as raw materials, were deposited on glass substrates by the method of metal organic chemical vapor deposition(MOCVD). The crystallization, microstructure and optical properties were investigated by scanning electronic microscope(SEM),X-ray diffraction(XRD) and ultraviolet-visible(UV-Vis)spectrophotometer. The results show that with the increase in Sn/Zn ratio, the crystal changes from wurtzite to rutile phase. When the ratio reaches 11:18,the intensity of Zn2SnO4 peaks appears to be the strongest and the optical band gap is about 3.27 eV. Calculated by the envelope method, the thickness of the ZTO thin films is 713.24 nm.Measured by UV-Vis spectrophotometer, the transmittance of the ZTO thin films reaches up to 80% in the wavelength range of 400-1000 nm when the Sn/Zn ratio is 7:18.
引用
收藏
页码:753 / 757
页数:5
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