共 50 条
- [32] Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme ultraviolet lithography EMERGING LITHOGRAPHIC TECHNOLOGIES VII, PTS 1 AND 2, 2003, 5037 : 249 - 256
- [34] Mask blanks for extreme ultraviolet lithography: ion beam sputter deposition of low defect density Mo/Si multilayers Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena, 1997, 15 (06):
- [35] Mask blanks for extreme ultraviolet lithography: Ion beam sputter deposition of low defect density Mo/Si multilayers JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06): : 2452 - 2454
- [37] Al/Au multilayers with different diffusion barrier layers for application as wafer-bonded UV reflectors 2016 IEEE CPMT SYMPOSIUM JAPAN (ICSJ), 2016, : 165 - 166