共 50 条
Risk Factors for Implant Failure Following Transcrestal Sinus-Floor Elevation: A Case Report and Literature Review
被引:0
|作者:
Zhang, Jie
[1
]
Weng, Mengjia
[1
]
Zhu, Zheng
[1
]
Li, Jing
[1
]
机构:
[1] Fudan Univ, Huadong Hosp, Dept Stomatol, Shanghai, Peoples R China
关键词:
transcrestal sinus-floor elevation;
dental implant;
early implant failure;
risk factors;
MAXILLARY SINUS;
RETROSPECTIVE ANALYSIS;
COMPLICATIONS;
AUGMENTATION;
CLASSIFICATION;
OUTCOMES;
D O I:
10.1563/aaid-joi-D-23-00134
中图分类号:
R78 [口腔科学];
学科分类号:
1003 ;
摘要:
Although transcrestal sinus floor elevation (TSFE) is widely used for cases of insufficient residual bone height in the posterior maxilla, few studies focus on the risk factors of early implant failure associated with TSFE procedures. This study aimed to identify and summarize the possible risk factors of implant failure associated with TSFE to ensure a more predictable implant survival rate using TSFE. We report the treatment of a patient with implant failure following TSFE and discuss this case's possible associated risk factors. A standard implant with a diameter of 4.8 mm and length of 10 mm was used after the TSFE procedure. Implant loosening was suddenly observed 6 weeks after the initial surgery. Factors that could result in early implant failure included patient-related risk factors, anatomical factors of the operational area, and operation- and implant-related factors. Within the current study's limitations, the graft material particles between the implant surface and socket could be considered a direct risk factor resulting in implant failure. Therefore, more attention should be paid to socket cleaning during the TSFE procedure, and loose particulate grafting materials should be discouraged. Another significant consideration for implant loss is the possibility of fractures in the buccal or palatal cortical plates during the site preparation and implant insertion. Thus, these factors should be studied further and receive more clinical attention.
引用
收藏
页码:482 / 491
页数:10
相关论文