Synthesis and sensing characterizations of nanostructured tin-doped Fe2O3 thin films

被引:0
|
作者
Jassem, E. K. [1 ]
Chichan, O. A. [2 ]
Allawai, M. F. [3 ]
Hussein, K. N. [4 ]
Chiad, S. S. [5 ]
Habubi, N. F. [6 ]
Kadhim, Y. H. [7 ]
Jadan, M. [8 ,9 ]
机构
[1] Middle Tech Univ, Inst Med Technol Baghdad, Audiol & speech Dept, Baghdad, Iraq
[2] Univ Babylon, Coll Educ Pure Sci, Dept Phys, Babylon, Iraq
[3] Univ Fallujah, Coll Appl Sci, Dept Med Phys, Fallujah, Iraq
[4] Al Manara Coll Med Sci, Dept Radiol, Amarah, Iraq
[5] Mustansiriyah Univ, Coll Educ, Dept Phys, Baghdad, Iraq
[6] Alnukhba Univ Coll, Dept Radiol & Sonar Tech, Baghdad, Iraq
[7] AL Mustaqbal Univ, Coll Haelth & Med Tech, Dept Opt Tech, Babylon 51001, Hillah, Iraq
[8] Imam Abdulrahman Bin Faisal Univ, Coll Sci, Dept Phys, POB 1982, Dammam 31441, Saudi Arabia
[9] Imam Abdulrahman Bin Faisal Univ, Basic & Appl Sci Res Ctr, POB 1982, Dammam 31441, Saudi Arabia
关键词
Sn; Thin films; XRD; AFM; SEM; Optical properties; bandgap; Sensitivity; MAGNETIC-PROPERTIES; OPTICAL-PROPERTIES; OXIDE-FILMS; PERFORMANCE; LITHIUM; SENSOR; ROUTE;
D O I
10.15251/DJNB.2024.194.1435
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Nanostructured Tin-doped Fe2O3 2 O 3 with a volumetric concentration of (1% and 3 %) Tin were deposited using spray pyrolysis (SPM). The most substantial peak, as determined by X-ray diffraction, corresponds to the (200). The average particle size values from AFM imaging for the deposited films decreased from 81.52 nm to 40.05 nm. The average roughness was observed to drop from 8.26 nm to 45.38 nm. The Root mean square roughness was lowered from 7.48 nm to 4.86 nm. The strain decreases from (27.92 to 23.69) x10-4.-4 . SEM images show morphological changes in Fe2O3 2 O 3 film's big islands after Tin doping. The optical transmittance is outstanding for Undoped Fe2O3 2 O 3 and 3% Sn doping, with 80% and 75 %in the visible zone. It was shown that the absorption coefficient increased as the concentration of Tin was raised. The Fe2O3 2 O 3 bandgap was reduced from 2.80 eV for Fe2O3 2 O 3 to 2.60 eV for Fe2O3: 2 O 3 : 3 % Sn film. Resistance in Fe2O3 2 O 3 and Tin-doped films rises in NO2 2 (270 ppm) exposure, indicating an oxidation process. The 3% Tin-doped film shows the highest resistance. Sensitivity declined with increasing Tin content following NO2 2 exposure.
引用
收藏
页码:1435 / 1447
页数:13
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