Electrophysical and thermoelectric properties and crystal structure of the formed Mn4Si7 thin vacuum coatings

被引：0
|
作者：
Igamov, B.D. [1 ]
Imanova, G.T. [2 ,3 ,4 ,5 ]
Loboda, V.V. [6 ]
Zhurikhina, V.V. [6 ]
Bekpulatov, I.R. [7 ]
Kamardin, A.I. [1 ]
机构：
[1] Scientific and Technical Center with a Design Bureau and Pilot Production of the Academy of Sciences of the Republic of Uzbekistan, Tashkent, Uzbekistan
[2] Institute of Radiation Problems, Ministry of Science and Education Republic of Azerbaijan, 9 B.Vahabzade str., Baku,AZ1143, Azerbaijan
[3] Khazar University, Department of Physics and Electronics, 41 Mahsati Str., Baku,AZ1096, Azerbaijan
[4] Western Caspian University, Baku,AZ-1001, Azerbaijan
[5] UNEC Research Center for Sustainable Development and Creen Economy Named After Nizami Ganjavi, Azerbaijan State University of Economics (UNEC), 6 Istiglaliyyat Str., Baku,1001, Azerbaijan
[6] Peter the Great St. Petersburg Polytechnic University, St. Petersburg, Russia
[7] Karshi State University, Karshi, Uzbekistan
来源：
Optical Materials: X | 2024年 / 24卷
关键词：
Powder coatings - Selenium compounds - Silicides;
D O I：
10.1016/j.omx.2024.100353
中图分类号：
学科分类号：
摘要：
The necessary information on the formation of high manganese silicide (Mn4Si7) coating by magnetron sputtering method is presented in this work. The technology and basic modes of creating the necessary targets for a magnetron sputtering device are presented. Targets were created by adding silicon and manganese powders in the required amount and heating them under vacuum conditions at high temperature and pressure. Thin silicide films (thin coatings) of different thicknesses were formed on the surface of silicon dioxide from the produced targets using the method of magnetron sputtering. The electrophysical and thermoelectric properties of the produced films were studied using physical and optical methods.Due to the change in the structure of the coatings during subsequent heat treatment, the Seebeck coefficient noticeably increases. © 2024 The Author(s)
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