Deposition of hydrogenated amporphous silicon by an inductively coupled glow discharge reactor with shield electrodes

被引：0

作者：

Yokota, Katsuhiro

Takada, Manabu

Ohno, Yoshikazu

Katayama, Saichi

机构：

来源：

Journal of Applied Physics | 1992年 / 72卷 / 03期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

共 50 条

[41] POLYMER-LIKE AND HARD AMORPHOUS HYDROGENATED CARBON-FILMS PREPARED IN AN INDUCTIVELY COUPLED R.F. GLOW-DISCHARGE
DWORSCHAK, W
KLEBER, R
FUCHS, A
SCHEPPAT, B
KELLER, G
JUNG, K
EHRHARDT, H
THIN SOLID FILMS, 1990, 189 (02) : 257 - 267
[42] X-RAY PHOTOELECTRON SPECTROSCOPY OF HYDROGENATED AMORPHOUS SILICON PREPARED BY GLOW DISCHARGE CHEMICAL VAPOR DEPOSITION TECHNIQUE.
Yokota, Katsuhiro
Kageyama, Tetsuya
Katayama, Saichi
Technology Reports of Kansai University, 1984, (25): : 67 - 72
[43] Self-sustained secondary discharge in inductively coupled plasma reactor
Walewski, J
Larjo, J
Hernberg, R
APPLIED PHYSICS LETTERS, 2000, 76 (18) : 2508 - 2510
[44] Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition
Di Mundo, Rosa
Palumbo, Fabio
Fracassi, Francesco
d'Agostino, Riccardo
PLASMA PROCESSES AND POLYMERS, 2008, 5 (08) : 770 - 777
[45] INFRARED-SPECTROSCOPY OF HYDROGENATED SILICON SULFUR ALLOYS PREPARED BY GLOW-DISCHARGE
ALDALLAL, S
HAMMAM, M
ALALAWI, SM
ALJISHI, S
BREITSCHWERDT, A
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, 1991, 63 (04): : 839 - 848
[46] INSITU ELLIPSOMETRY STUDIES OF THE GROWTH OF HYDROGENATED AMORPHOUS-SILICON BY GLOW-DISCHARGE
COLLINS, RW
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 514 - 517
[47] Optical switching in hydrogenated amorphous silicon-sulfur alloy prepared by glow discharge
Al-Dallal, S
Henari, FZ
Al-Alawi, SM
Arekat, SR
Manaa, H
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2004, 345 : 302 - 305
[48] EFFECTS OF PREPARATION CONDITIONS ON THE PROPERTIES OF GLOW DISCHARGE-PRODUCED AMORPHOUS HYDROGENATED SILICON
POTTS, JE
MCMILLAN, JA
PETERSON, EM
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1981, 26 (03): : 388 - 388
[49] HYDROGENATED AMORPHOUS-SILICON FILMS PREPARED IN CASCADED GLOW-DISCHARGE REACTORS
PANWAR, OS
DIXIT, PN
BHATTACHARYYA, R
SHAH, VV
JOURNAL OF APPLIED PHYSICS, 1986, 59 (05) : 1578 - 1586
[50] MECHANISM OF PHOTOLUMINESCENCE IN HYDROGENATED AND CHLORINATED AMORPHOUS-SILICON PREPARED BY GLOW-DISCHARGE
ALDALLAL, S
JOURNAL OF LUMINESCENCE, 1984, 31-2 (DEC) : 406 - 408

← 1 2 3 4 5 →