Properties of hydrogenated amorphous silicon prepared by ECR plasma CVD method

被引：0
|
作者：
Kitagawa, Masatoshi [1 ]
Setsune, Kentaro [1 ]
Manabe, Yoshio [1 ]
Hirao, Takashi [1 ]
机构：
[1] Matsushita Electric Industrial Co, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1988年 / 27卷 / 11期
关键词：
Electron Cyclotron Resonance Plasma - Hydrogenated Amorphous Silicon - Infrared Absorption Spectra - Optical Emission Spectra - Optical Gaps - Plasma Chemical Vapor Deposition;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
(Edited Abstract)
引用
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页码：2026 / 2031
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