Properties of Si3N4 and ALN films produced by reactive ion plating and gas discharge sputtering

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作者：
Monz, K.H.
Quang Danh, Nguyen
Huter, M.
Rille, E.P.
Pulker, H.K.
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Vakuum in Forschung und Praxis | 1995年 / 7卷 / 03期
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页码：221 / 224
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