Preparation of Cu-O films by sputtering using He gas

被引：0
|
作者：
Fujii, Takamichi [1 ]
Koyanagi, Tsuyoshi [1 ]
Morofuji, Kouji [1 ]
Kashima, Tetsuya [1 ]
Matsubara, Kakuei [1 ]
机构：
[1] Yamaguchi Univ, Ube, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 1994年 / 33卷 / 7 B期
关键词：
Copper oxides;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
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页码：4482 / 4485
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