Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: Film chemistries, slurry formulation and polish selectivity

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Wang, Y.-L. [1 ]
Liu, C. [1 ]
Chang, S.-T. [1 ]
Tsai, M.-S. [1 ]
Feng, M.-S. [1 ]
Tseng, W.-T. [1 ]
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[1] Chiao-Tung Univ, Hsin-Chu, Taiwan
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页码:550 / 554
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