Chemical-mechanical polishing of low-dielectric-constant spin-on-glasses: Film chemistries, slurry formulation and polish selectivity

被引：0
|
作者：
Wang, Y.-L. [1 ]
Liu, C. [1 ]
Chang, S.-T. [1 ]
Tsai, M.-S. [1 ]
Feng, M.-S. [1 ]
Tseng, W.-T. [1 ]
机构：
[1] Chiao-Tung Univ, Hsin-Chu, Taiwan
来源：
Thin Solid Films | 1997年 / 308-309卷
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页码：550 / 554
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