Work function of transparent conducting multicomponent oxide thin films prepared by magnetron sputtering

被引：0
|
作者：
Kanazawa Inst of Technology, Ishikawa, Japan [1 ]
机构：
来源：
Surf Coat Technol | / 1-3卷 / 583-587期
关键词：
Number:; -; Acronym:; MEXT; Sponsor: Ministry of Education; Culture; Sports; Science and Technology;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [41] TRANSPARENT CONDUCTIVE FILMS PREPARED BY DC MAGNETRON SPUTTERING
    MIKOSHIBA, H
    SUGIYAMA, I
    NIPPON KAGAKU KAISHI, 1986, (03) : 255 - 260
  • [42] Characteristics of transparent conducting Al-doped ZnO films prepared by dc magnetron sputtering
    Jung, Sung-Mok
    Kim, Young-Hwan
    Kim, Seong-Il
    Yoo, Sang-Im
    CURRENT APPLIED PHYSICS, 2011, 11 (01) : S191 - S196
  • [43] Transparent Conducting ZnO:Ga Films Prepared on PEN Substrates by Using RF Magnetron Sputtering
    Kim, Jeong-Yeon
    Kim, Byeong-Guk
    Lee, Seok-Jin
    Park, Seung-Beum
    Park, Jae-Hwan
    Lim, Dong-Gun
    Kweon, Soon-Yong
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2010, 56 (05) : 1467 - 1471
  • [44] Transparent conducting oxide thin films of Cd2SnO4 prepared by RF magnetron co-sputtering of the constituent binary oxides
    Mamazza, R
    Morel, DL
    Ferekides, CS
    THIN SOLID FILMS, 2005, 484 (1-2) : 26 - 33
  • [45] An investigation of the work function and stability of chromium oxide thin films deposited by reactive magnetron sputtering
    A. M. Oje
    A. A. Ogwu
    Alex I. Oje
    Journal of Applied Electrochemistry, 2022, 52 : 1551 - 1562
  • [46] Properties of transparent zinc-stannate conducting films prepared by radio frequency magnetron sputtering
    Electron Device System Laboratory, Kanazawa Institute of Technology, 7-1 Ohgigaoka, Nonoichi, Ishikawa 921, Japan
    J. Vac. Sci. Technol. A Vac. Surf. Films, 3 (1095-1099):
  • [47] Zinc oxide - a transparent, conducting IR-reflector prepared by rf-magnetron sputtering
    Das, R
    Ray, S
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2003, 36 (02) : 152 - 155
  • [48] An investigation of the work function and stability of chromium oxide thin films deposited by reactive magnetron sputtering
    Oje, A. M.
    Ogwu, A. A.
    Oje, Alex, I
    JOURNAL OF APPLIED ELECTROCHEMISTRY, 2022, 52 (10) : 1551 - 1562
  • [49] Thin HfSiN Films prepared by Magnetron Sputtering
    Zhang, Zaiyu
    Liang, Yilong
    Jiang, Xianbang
    PROCEEDINGS OF THE 5TH INTERNATIONAL CONFERENCE ON ADVANCED DESIGN AND MANUFACTURING ENGINEERING, 2015, 39 : 371 - 374
  • [50] Physical properties of transparent conducting indium doped zinc oxide thin films deposited by pulsed DC magnetron sputtering
    Young Ran Park
    Donggeun Jung
    Ki-Chul Kim
    Su Jeong Suh
    Tae Seok Park
    Young Sung Kim
    Journal of Electroceramics, 2009, 23
12345