Plasma immersion ion implantation for electronic materials

被引：0

作者：

Jones, Erin C. ^{[1
]}

Linder, Barry P. ^{[1
]}

Cheung, Nathan W. ^{[1
]}

机构：

[1] Univ of California, Berkeley, United States

来源：

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 2 B期

关键词：

D O I：

暂无

中图分类号：

学科分类号：

摘要：

引用

页码：1027 / 1036

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