Plasma immersion ion implantation for electronic materials

被引：0
|
作者：
Jones, Erin C. [1 ]
Linder, Barry P. [1 ]
Cheung, Nathan W. [1 ]
机构：
[1] Univ of California, Berkeley, United States
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1996年 / 35卷 / 2 B期
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页码：1027 / 1036
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