ZBA-21 electron-beam exposure system

被引：0
|
作者：
Plontke, Rainer
Eichhorn, Hans
机构：
来源：
Jena Review | 1988年 / 33卷 / 01期
关键词：
Integrated Circuit Manufacture - Semiconductor Device Manufacture;
D O I：
暂无
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学科分类号：
摘要：
The ZBA-21 is a productive, highly accurate electron-beam exposure system designed for pattern delineation on masks (sized up to 7 in.) and wafers (up to 150 mm dia.) in the fabrication of integrated circuits with integration levels up to that of the 4-M dRAM. The system is based on the practice-approved concept of the ZBA-20, with special allowance being made for practical requirements.
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页码：22 / 23
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