ZBA-21 electron-beam exposure system

被引：0
|
作者：
Plontke, Rainer
Eichhorn, Hans
机构：
来源：
Jena Review | 1988年 / 33卷 / 01期
关键词：
Integrated Circuit Manufacture - Semiconductor Device Manufacture;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The ZBA-21 is a productive, highly accurate electron-beam exposure system designed for pattern delineation on masks (sized up to 7 in.) and wafers (up to 150 mm dia.) in the fabrication of integrated circuits with integration levels up to that of the 4-M dRAM. The system is based on the practice-approved concept of the ZBA-20, with special allowance being made for practical requirements.
引用
收藏
页码：22 / 23
相关论文
共 50 条
  • [1] Simulation of exposure process in ZBA-21 E-beam lithography system
    Zlobin, VA
    Vasiljeva, OG
    IZVESTIYA AKADEMII NAUK SERIYA FIZICHESKAYA, 1996, 60 (02): : 135 - 137
  • [2] ELECTRON-BEAM EXPOSURE SYSTEM
    QIU, PY
    WANG, JK
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1824 - 1826
  • [3] ZBA 20 - THE NEW ELECTRON-BEAM EXPOSURE SYSTEM OF JENOPTIK JENA GmbH INITIATES THE SECOND MACHINE GENERATION.
    Binder, Hans Joerg
    Sonnefeld, Klaus
    Christ, Erich
    Oswald, Horst
    Jena Review, 1982, 27 (02): : 62 - 67
  • [4] QUADRUPOLE ELECTRON-BEAM EXPOSURE SYSTEM
    OKAYAMA, S
    KAWAKATSU, H
    JOURNAL OF ELECTRON MICROSCOPY, 1980, 29 (03): : 318 - 318
  • [5] APPLICATIONS OF ELECTRON-BEAM EXPOSURE SYSTEM
    PEASE, RFW
    BALLANTYNE, JP
    HENDERSON, RC
    VOSHCHENKOV, AM
    YAU, LD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 393 - 399
  • [6] ELECTRON-BEAM EXPOSURE SYSTEM AMDES
    SUGIYAMA, N
    SAITOH, K
    COMPUTER-AIDED DESIGN, 1979, 11 (02) : 59 - 65
  • [7] FIELD EMITTER ELECTRON-BEAM EXPOSURE SYSTEM
    STILLE, G
    ASTRAND, B
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 921 - 921
  • [8] FIELD EMITTER ELECTRON-BEAM EXPOSURE SYSTEM
    STILLE, G
    ASTRAND, B
    PHYSICA SCRIPTA, 1978, 18 (06): : 367 - 371
  • [9] MASK FABRICATION USING ELECTRON-BEAM EXPOSURE SYSTEM
    WATAKABE, Y
    SHIGETOMI, A
    MORIMOTO, H
    KATO, T
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1981, 275 : 62 - 69
  • [10] A COMPREHENSIVE TEST SEQUENCE FOR THE ELECTRON-BEAM EXPOSURE SYSTEM
    ZAVECZ, TE
    SOLID STATE TECHNOLOGY, 1982, 25 (02) : 106 - 110
12345