Influence of B2H6/CH4 and B(CH3)3 as process gas on boron carbide coatings: An in situ photoelectron spectroscopy study

被引：0
|
作者：
Kunzli, H. [1 ]
Gantenbein, P. [1 ]
Steiner, R. [1 ]
Oelhafen, P. [1 ]
机构：
[1] Inst fur Physik der Universitat, Basel, Basel, Switzerland
来源：
Journal of Nuclear Materials | 1992年 / 196-98卷
关键词：
Boron carbide;
D O I：
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学科分类号：
摘要：
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页码：622 / 626
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