ABSORPTION OF RF POWER BY A PLASMA IN A MAGNETIC FIELD.

The absorption of rf power by a plasma in an alternating electric field and a constant magnetic field at right angles to one another has been investigated experimentally. The plasma is produced between two coaxial cylinders (800 mm long and 12 and 70 mm in diameter, respectively), between which an rf voltage of frequency f equals 7. 4 MHz and of amplitude V up to 200 V is applied. The magnetic field H is varied over the range 0 - 1100 Oe. The rf power P absorbed by the plasma and the alternating electric field in the plasma, E, are measured for various values of H, V, and p. It is shown that at small values of p the power P is much higher than the calculated values at large values of H and V. The nature of the anomalous rf absorption is discussed.