Transparent, conductive CuI films prepared by rf-dc coupled magnetron sputtering

被引：0
|
作者：
Hiroshima Inst of Technology, Hiroshima, Japan [1 ]
机构：
来源：
Thin Solid Films | / 1-2卷 / 179-181期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [21] HIGHLY TRANSPARENT AND CONDUCTIVE ZINC-STANNATE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
    MINAMI, T
    SONOHARA, H
    TAKATA, S
    SATO, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1994, 33 (12A): : L1693 - L1696
  • [22] PROPERTIES OF CONDUCTIVE ZINC-OXIDE FILMS FOR TRANSPARENT ELECTRODE APPLICATIONS PREPARED BY RF MAGNETRON SPUTTERING
    SCHROPP, REI
    MADAN, A
    JOURNAL OF APPLIED PHYSICS, 1989, 66 (05) : 2027 - 2031
  • [23] CONDUCTIVE AND TRANSPARENT AL-DOPED ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING
    CHEN, YI
    DUH, JG
    MATERIALS CHEMISTRY AND PHYSICS, 1991, 27 (04) : 427 - 439
  • [24] Effect of DC bias voltage on the deposition rate for Ni thin films by RF-DC coupled unbalanced-magnetron sputtering
    Mikami, Y
    Yamada, K
    Ohnari, A
    Degawa, T
    Migita, T
    Tanaka, T
    Kawabata, K
    Kajioka, H
    SURFACE & COATINGS TECHNOLOGY, 2000, 133 : 295 - 300
  • [25] HIGHLY CONDUCTIVE AND TRANSPARENT ZNO THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING IN AN APPLIED EXTERNAL DC MAGNETIC-FIELD
    MINAMI, T
    NANTO, H
    TAKATA, S
    THIN SOLID FILMS, 1985, 124 (01) : 43 - 47
  • [26] Transparent conductive Al and Mn doped ZnO thin films prepared by DC reactive magnetron sputtering
    Cao, HT
    Pei, ZL
    Gong, J
    Sun, C
    Huang, RF
    Wen, LS
    SURFACE & COATINGS TECHNOLOGY, 2004, 184 (01): : 84 - 92
  • [27] Discharge characteristics and effect of DC bias on the deposition rate of Ni thin films using RF-DC coupled magnetron sputtering
    Mikami, Yasuo
    Yamada, Keiji
    Ohnari, Akio
    Degawa, Toru
    Tanaka, Takeshi
    Kawabata, Keishi
    Shinku/Journal of the Vacuum Society of Japan, 2000, 43 (03) : 307 - 310
  • [28] Effect of vacuum annealing on the properties of transparent conductive AZO thin films prepared by DC magnetron sputtering
    Fang, G.J.
    Li, D.J.
    Yao, B.-L.
    Physica Status Solidi (A) Applied Research, 2002, 193 (01): : 139 - 152
  • [29] Effect of vacuum annealing on the properties of transparent conductive AZO thin films prepared by DC magnetron sputtering
    Fang, GJ
    Li, DJ
    Yao, BL
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2002, 193 (01): : 139 - 152
  • [30] Characterization of transparent ATO conducting films prepared by RF magnetron sputtering
    Lee, Sung Uk
    Park, Yong Seob
    Hong, Byungyou
    JOURNAL OF THE KOREAN CRYSTAL GROWTH AND CRYSTAL TECHNOLOGY, 2008, 18 (02): : 76 - 80
12345