FLUORESCENCE TECHNIQUES ALLOW DEFECT STUDY IN MICROELECTRONICS.

被引：0
|
作者：
Kern, W.
Comizzoli, R.B.
Schnable, G.L.
机构：
来源：
Industrial research/development | 1982年 / 24卷 / 05期
关键词：
FLUORESCENCE - Applications - ULTRAVIOLET RADIATION;
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学科分类号：
摘要：
The study of corrosion in small metal structures such as integrated circuit (IC) interconnections is complicated by the fact that such structures are analyzed after corrosion has taken place and the metal electrode has been totally or partially destroyed. Also, the corrosion product normally causes disruption of the overlying dielectric layer. Several methods are reviewed that are based on the use of ultraviolet fluorescing materials to demarcate or decorate the sites of interest for microscopic observation. Electrophoretic cell method and decoration by electrostatic charging are described.
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页码：151 / 160
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