Hydrogenated carbon nitride thin films deposited by the plasma chemical vapor deposition technique using trimethylamine and ammonia

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作者：
Kobayashi, Satoshi [1 ]
Nozaki, Shinji [1 ]
Morisaki, Hiroshi [1 ]
Masaki, Susumu [1 ]
机构：
[1] Univ of Electro-Communications, Tokyo, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers | 1997年 / 36卷 / 08期
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页码：5187 / 5191
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