CLEANING AND RECYCLING PARTICLE PILOT WAFERS WITH A BRUSH SCRUBBER.

被引:0
|
作者
Townsend, R.Brent
机构
来源
Microcontamination | 1988年 / 6卷 / 04期
关键词
BRUSH SCRUBBER - PARTICULATE MONITORING - RECYCLING PARTICLE PILOT WAFERS - WAFER CONTAMINATION;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
页码:39 / 41
相关论文
共 31 条
  • [21] Development of a confined pulse-jet particle cleaning technology for semiconductor wafers
    Chein, H.
    Huang, T.-Y.
    Tsai, C.-J.
    1998, Elsevier Ltd (29)
  • [22] PARTICLE COLLECTION BY A PILOT-PLANT VENTURI SCRUBBER DOWNSTREAM FROM A PILOT-PLANT ELECTROSTATIC PRECIPITATOR
    SPARKS, LE
    RAMSEY, GH
    DANIEL, BE
    ATMOSPHERIC ENVIRONMENT, 1981, 15 (01) : 65 - 72
  • [23] Particle removal efficiency and damage analysis on silicon wafers after megasonic cleaning in solvents
    Barbagini, Francesca
    Halder, Sandip
    Janssens, Tom
    Kenis, Karine
    Wostyn, Kurt
    Bearda, Twan
    Quoc, Toan-Le
    Leunissen, Peter
    Mertens, Paul
    Kim, Kyung-Hyun
    Andreas, Michael
    Journal of Adhesion Science and Technology, 2009, 23 (12): : 1709 - 1721
  • [24] Particle Removal Efficiency and Damage Analysis on Silicon Wafers after Megasonic Cleaning in Solvents
    Barbagini, Francesca
    Halder, Sandip
    Janssens, Tom
    Kenis, Karine
    Wostyn, Kurt
    Bearda, Twan
    Quoc, Toan-Le
    Leunissen, Peter
    Mertens, Paul
    Kim, Kyung-Hyun
    Andreas, Michael
    JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 2009, 23 (12) : 1709 - 1721
  • [25] Meniscus-shear particle detachment in foam-based cleaning of silicon wafers
    Radke, Clayton J.
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2011, 242
  • [26] Landfill gas upgrading with pilot-scale water scrubber: Performance assessment with absorption water recycling
    Lantela, J.
    Rasi, S.
    Lehtinen, J.
    Rintala, J.
    APPLIED ENERGY, 2012, 92 : 307 - 314
  • [27] Meniscus-Shear Particle Detachment in Foam-Based Cleaning of Silicon Wafers with an Immersion/Withdrawal Cell
    Andreev, V. A.
    Prausnitz, J. M.
    Radke, C. J.
    INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH, 2010, 49 (24) : 12461 - 12470
  • [28] New methods to evaluate cleaning processes by detecting the particle load on surfaces of diamond wire sawn silicon wafers
    Lottspeich, Lydia
    Herold, Ilko
    Richter, Hubertus
    Kaden, Thomas
    7TH INTERNATIONAL CONFERENCE ON SILICON PHOTOVOLTAICS, SILICONPV 2017, 2017, 124 : 752 - 758
  • [29] Modeling of particle removal using non-contact brush scrubbing in post-CMP cleaning processes
    Chein, Reiyu
    Liao, Wenyuan
    Journal of Adhesion, 2006, 82 (06): : 555 - 575
  • [30] Modeling of particle removal using non-contact brush scrubbing in post-CMP cleaning processes
    Chein, Reiyu
    Liao, Wenyuan
    JOURNAL OF ADHESION, 2006, 82 (06): : 555 - 575